Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy

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Individual chapters can be purchased as PDF downloads

Auger Electron Spectroscopy (AES) and X-ray Photoelectron Spectroscopy (XPS or ESCA) are well-established techniques for surface analysis and also (when combined with sputter depth profiling) for thin film and interface analysis. Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy is the first comprehensive treatment of the subject for over 10 years.

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    2200 g
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There have been many advances in instrumentation and performance, understanding of electron spectroscopy fundamentals, experimental methodology and data interpretation, which have markedly enhanced the capabilities of AES and XPS. This new information is now integrated into this thoroughly up-to-date reference volume for the benefit of researcher and practical analyst alike.

In Surface Analysis by Auger and X-Ray Photoelectron Spectroscopy we have chosen not to include chapters on specific areas of application, since there are many reviews in the literature which meet this need. Rather the space has been devoted to all aspects of the techniques themselves. Although the overall coverage is highly integrated, the individual chapters stand alone as authoritative accounts of that particular aspect of the subject. We have also taken the opportunity, through the extensive Appendices to collect together, in one place, a great deal of practically useful reference data including web-based information. 

The authors are all internationally recognised and come from Australia, Europe, Japan and the USA.

Individual chapters can be purchased as PDF downloads

Prologue: ToF-SIMS—An evolving mass spectrometry of materials
John C. Vickerman
The history of Static SIMS—A personal perspective
Alfred Benninghoven
Perspectives and basic Principles
Perspectives on XPS and AES
David Briggs and John T. Grant
XPS: Basic Principles, Spectral Features and Qualitative Analysis
David Brigg
AES: Basic Principles, Spectral Features and Qualitative Analysis
John T. Grant
Sample handling, instrumentation and beam effects
Specimen Preparation and Handling
Joseph Geller
XPS: Instrumentation and Performance
Ian W. Drummond
AES Instrumentation and Performance
Masato Kudo
Instrument Calibration for AES and XPS
Martin P. Seah
Analysing Insulators with XPS and AES
Michael A. Kelly
Beam Effects During AES and XPS Analysis
Don R. Bear, Dan J. Gaspar, Mark H. Engelhard and A.Scott Lea
Surface sensitivity
Electron Transport in solids
Wolfgang S. M. Werner
Electron Attenuation Lengths
Shigeo Tanuma
Quantification of Nano-structures by Electron Spectroscopy
Sven Tougaard
Quantification in AES and XPS
Martin P. Seah
Spectral interpretation
The Use of Chemometrics in AES and XPS Data Treatment
William F. Stickle
XPS Lineshapes and Curve Fitting
Neal Fairley
Chemical Effects in XPS
Laszlo KoÖver
Chemical Information from Auger Lineshapes
David E. Ramaker
The Auger Parameter
Giuliano Moretti
Valence Bands Studied by XPS
Peter M.A. Sherwood
Structural effects
Structural Effects in XPS and AES: Diffraction
J. Osterwalder
Electron Backscattering and Channelling
Ding Ze-jun and Ryuichi Shimizu
Depth profiling
Sputter Depth Profiling in AES and XPS
Thomas Wagner, Jiang Y. Wang and Siegfried Hofmann
Angle-Resolved X-Ray Photoelectron Spectroscopy
Peter J. Cumpson
XPS Imaging
Kateryna Artyushkova and Julia E. Fulghum
Processing, Interpretation and Quantification of Auger Images
Martin Prutton
Developing aspects
X-ray Photoelectron Spectroscopy and Imaging at Synchrotrons
G. Margaritondo
Total reflection X-Ray Photoelectron Spectroscopy
Yoshitoki Lijima
Ion-Excited Auger Electron Spectroscopy
John T. Grant
Positron-Annihilation-Induced Auger electron Spectroscopy
Toshiyuki Ohdaira and Ryoichi Suzuki
Electron Coincidence Measurements
Stephen M. Thurgate
Recent Developments in the Theory of Auger Spectroscopy
Peter Weightman
Peak Positions from MG X-Rays and from Al X-Rays by Atomic Number
Peak Positions from Mg X-Rays and from Al X-Rays in Numerical Order
Auger Kinetic Energies and Sensitivity Factors by Atomic Number
Auger Kinetic Energies in Numerical Order
Polymer C 1s Chemical Shifts
Comparing Beam Damage Rates Using Susceptibility Tables
D.R. Baer, M.H Engelhard, A.S. Lea and D.J. Gaspar
Manufacturers of AES and XPS Systems
John T. Grant
Software for Processing AES and XPS Data
John T. Grant
John T. Grant
Measurement and Documentary Standards
John T. Grant
Internet Resources
John T. Grant

Prof. David Briggs BSc (Chem.), PhD, DSc received his degrees from the University of Durham. His career as a research scientist included 27 years with ICI plc, when he also held a number of visiting professorships, and six years as Professor of Surface Chemical Analysis at the University of Nottingham. During this time he published over 200 papers/articles and 10 books in his specialised field. In addition he was editor-in-chief of an international journal, a consultant and co-founder of a niche publishing company.

Prof. John T. Grant has extensive experience in the field of surface science, having worked in this area for over 35 years. He is an expert with the techniques used in such studies and has extensive experience in Auger electron spectroscopy (AES), x-ray photoelectron spectroscopy (XPS or ESCA), ion bombardment of solids, sputter depth profiling, ion scattering spectroscopy (ISS), secondary ion mass spectroscopy (SIMS), scanning electron microscopy (SEM), low energy electron diffraction (LEED), ionization loss spectroscopy, soft x-ray appearance potential spectroscopy (APS), surface conductivity, surface photovoltaic effects, gas adsorption and desorption, electron beam interactions with solid surfaces, surface cleaning procedures, ultrahigh vacuum techniques, specimen preparation techniques, and controlled cleavage or fracture of specimens. He has worked with polymers, metals, semiconductors, and insulators. Dr. Grant has worked in this field in Australia, Europe, and the United States and is an internationally-recognized authority in the field of surface science. He is currently conducting research on optical coatings and nanomaterials.

  • Editors
    David Briggs and John T. Grant
  • Binding
  • Pages
  • ISBN-13
  • ISBN-10
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